PlasmaEtching相关论文
A comparison study on reactive ion etched silicon wafers with and without silver nano-particle masks
In this work,multicrystalline silicon (mc-Si) wafers were surface textured by SF6/O2 reactive ion etching (RIE).Such tec......
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Effects of Plasma Power and Reaction Gases on the Surface Properties of ePTFE Materials in Plasma Mo
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Reduction of global warming gas emission during silicon nitride etching by using C3F6/O2 gas chemist
Global warming gas emission such as perfluorocarbon compounds (PFCs) has been an issue in the semiconductor and display ......
Etching characteristics of SiO2 layer using amorphous carbon mask in dual-frequency capacitively cou
As critical dimension (CD) in the nano-scale semiconductor devices during the fabrication of Si integrated circuits cont......
Frequency and reverse time effects on asymmetric bipolar pulsed DC BCl3 etching of GaAs were investigated.Gas flow rate ......
In technology generation of 10-nm half-pitch and beyond,fluctuation of feature size and shape at subnanometer-scale beco......
A flat-response x-ray detector is a combination of a windowless x-ray diodes and a compound filter,which is applied for ......
Microchannel plate(MCP)which is assembled from millions of single-channel electron multiplier(CEM)is the key component o......
Facile synthesis of defected TiO2-x (B) nanosheet/graphene oxide hybrids with high photocatalytic ac
TiO2 (B) nanosheets/GO (graphene oxide) hybrids are considered to be outstanding performance pho-tocatalysts for high ef......
2D transition metal dichalcogenides(TMDs)have been considered as promising non-precious electrocatalysts for the hydroge......
